Effect of Pressure of Nitrogen Atmosphere During the Vacuum Arc Deposition of Multiperiod Coatings (Ti, Si)N/MoN on their Structure and Properties
| Authors | V.M. Beresnev1 , O.V. Sobol2 , A.A. Meylekhov2 , A.A. Postelnik2 , V.Yu. Novikov3, Y.S. Kolesnikov3, V.A. Stolbovoy4, U.S. Nyemchenko1 , P.A. Srebniuk1 |
| Affiliations |
1 V.N. Karazin Kharkiv National University, 4, Svobody sq., 61022 Kharkiv, Ukraine 2 National Technical University «Kharkiv Polytechnic Institute», 21, Kyrpychova st., 61002 Kharkiv, Ukraine 3 Belgorod State National Research University, 85, Pobiedy st., 308015 Belgorod, Russia 4 National Science Center «Kharkiv Institute of Physics and Technology», 1, Akademichna st., 61108 Kharkiv, Ukraine |
| Е-mail | |
| Issue | Volume 8, Year 2016, Number 4 |
| Dates | Received 30 June 2016; revised manuscript received 23 November 2016; published online 29 November 2016 |
| Citation | V.M. Beresnev, O.V. Sobol, A.A. Meylekhov, et al., J. Nano- Electron. Phys. 8 No 4(1), 04023 (2016) |
| DOI | 10.21272/jnep.8(4(1)).04023 |
| PACS Number(s) | 61.46. – w, 62.20.Qp, 62-65. – g |
| Keywords | Multilayer coating, (Ti (4) , Si)N/MoN, Pressure (12) , Nitrogen pressure, High temperature annealing, Structure (105) , Hardness (12) . |
| Annotation |
Using complex structural engineering methods, including: elemental analysis, X-ray diffraction studies and microhardness tests, the influence of the operating pressure of nitrogen atmosphere during the deposition (PN) on the formation of phase, structural state, and mechanical properties of multiperiod vacuum arc coatings of the system (Ti, Si)N/MoN has been studied. It is shown that in the range of used pressures PN 0,05…0,67 Pa, with the increase of pressure, the changes at the element level occur: Si content decreases, N and Mo/Ti ratios increase). At the phase level changes mainly occur in the molybdenum-based layers, where with the increase of pressure, a transition Mo → -Mo2N → MoN occurs. Maximum hardness (37.5 GPa) in this case is achieved during the formation of TiN/-Mo2N layers with isostructural crystal lattice. The use of high-temperature annealing (1023 K) allows to increase the hardness of the coatings produced at a relatively low PN 0,09 Pa, when, due to the low content of nitrogen, the formation of additional solid phase Ti5Si3 is possible. |
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