Authors | D.P. Slobodzyan , B.V. Pavlyk , M.O. Kushlyk |
Affiliations | Ivan Franko National University of Lviv, 107, Henerala Tarnavs’kogo St., 79000 Lviv, Ukraine |
Е-mail | slobodzyan_d@ukr.net |
Issue | Volume 7, Year 2015, Number 4 |
Dates | Received 28 July 2015; published online 10 December 2015 |
Citation | D.P. Slobodzyan, B.V. Pavlyk, M.O. Kushlyk, J. Nano- Electron. Phys. 7 No 4, 04051 (2015) |
DOI | |
PACS Number(s) | 61.72.Lk, 61.72.Uf, 73.20.At, 73.40.Qv, 74.25.Ha, 78.70. – g |
Keywords | Silicon (58) , Surface-barrier structures, X-rays (2) , Magnetic field (7) , Dislocations (2) , I-V characteristics (2) , C-V characteristics (3) , Surface states. |
Annotation | This paper reviews the influence of low doses X-rays (D < 400 Gy) and weak magnetic field (B = 0.17 T) on the I-V and C-V characteristics changes of surface-barrier Bi-Si-Al structures based on p-Si crystals with dislocation concentration > 102 cm – 2 in the surface layer of silicon. The charge accumulation in the SiO2 dielectric layer of the structures under the action of external fields was investigated and analyzed. |
List of References English version of article |