Determination of Critical Values for Parameters of Electron Beam Microprocessing of Optical Plates with Double Curvature

Authors I.V. Yatsenko1 , V.S. Antonyuk2 , V.P. Maslov3 , V.А. Vashchenko1 , V.I. Gordienko1 , S.О. Kolinko1 , Т.І. Butenko1

1Cherkasy State Technological University, 460, Shevchenko Blvd., 18006 Cherkassy, Ukraine

2National Technical University of Ukraine "Kyiv Polytechnic Institute named after Igor Sikorsky", 37, Peremohy Ave., 03056 Kyiv, Ukraine

3V.E. Lashkaryov Institute of Semiconductor Physics NAS of Ukraine, 45, Nauky Ave., 02000 Kyiv, Ukraine

Issue Volume 5, Year 2013, Number 4
Dates Received 25 July 2023; revised manuscript received 18 October 2023; published online 30 October 2023
Citation I.V. Yatsenko, V.S. Antonyuk, V.P. Maslov, и др., J. Nano- Electron. Phys. 5 No 4, 05030 (2013)
PACS Number(s) 42.79. Bh
Keywords instrumentation, Elements made of optical glass and ceramics, Electron beam technology, Maximum permissible thermoelastic stresses in optical elements.
Annotation The widespread use of electron beam technology in optoelectronic instrumentation is constrained by the limited data on the critical values of the parameters of the electron beam (density of thermal effect of the beam, the time of this effect, etc.) on the optical elements of devices of various geometric shapes (flat, rectangular and curvilinear elements, etc.), the excess of which leads to the destruction of their surface layers (the appearance of cracks, chips, cavities, violation of surface flatness, etc.). Currently, the ranges of change for these parameters for flat plates, rectangular bars, cylindrical and spherical elements have been determined. However, the studies mentioned are absent for optical elements in the form of plates of double curvature, widely used in integral and fiber optics, microoptics and other areas of optoelectronic instrumentation. The work is devoted to the development of mathematical models of the thermal effect of an electron beam on optical elements in the form of plates of double curvature, that allow with a relative error of 5... 7 % to determine the critical ranges of changes in its parameters (density of thermal effect, time of its action), the excess of which leads to a deterioration in the physical and mechanical properties of the surface layers in the elements up to their destruction. This allows to prevent possible deterioration of technical and operational characteristics at the stage of manufacturing devices with the usage of electron beam technology.

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