Comparison of Atomic Level Simulation Studies of MOSFETs Containing Silica and Lantana Nanooxide Layers

Authors K. Bikshalu1, M.V. Manasa2, V.S.K. Reddy3, P.C.S. Reddy4, K. Venkateswara Rao2

1 Kakatiya university College of Engineering &Technology, Kakatiya University, Warangal A.P, India- 506001

2 Centre for Nano Science and Technology, Institute of Science and Technology, Jawaharlal Nehru Technological University Hyderabad

3 Mallareddy college of Engineering and Technology, Secunderabad – 500014

4 Jawaharlal Nehru Technological University Hyderabad, Hyderabad, Andhra Pradesh, India -500085

Issue Volume 5, Year 2013, Number 4
Dates Received 13 August 2013; published online 31 January 2014
Citation K. Bikshalu, M.V. Manasa, V.S.K. Reddy, et al., J. Nano- Electron. Phys. 5 No 4, 04058 (2013)
PACS Number(s) 85.30.Tv, 85.35. – p
Keywords MOSFET (31) , Nano oxide layer, Quantum mechanical tunneling, Transmission spectra (4) , I-V characteristics (2) , Channel conductance.
Annotation The intense downscaling of a Metal Oxide Semiconductor Field Effect Transistor (MOSFET) to nano range for improving the device performance requires a high-k dielectric material instead of conventional silica (SiO2) as to avoid Quantum Mechanical Tunneling towards the gate terminal which leads to unnecessary gate current. Out of all the rare earth oxide materials, since lanthana (La2O3) has significantly high dielectric constant (k) and bandgap, we’ve chosen it as oxide layer for one of the MOSFETs. In this work, we simulated two MOSFETs – one with nano SiO2 oxide layer and other with nano La2O3 oxide layer in the atomic level to analyze and compare the transmission spectra, I-V characteristics and Channel conductance of both the MOSFETs.

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