Diode Based on Amorphous SiC

Authors V.S. Zakhvalinskii , L.V. Borisenko, A.J. Aleynikov, E.A. Piljuk , I. Goncharov, S.V. Taran
Affiliations

Belgorod National Research University, 85, Pobedy Str., 308015 Belgorod, Russia

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Issue Volume 5, Year 2013, Number 4
Dates Received 11 October 2013; revised manuscript received 05 November 2013; published online 10 December 2013
Citation V.S. Zakhvalinskii, L.V. Borisenko, A.J. Aleynikov, et al., J. Nano- Electron. Phys. 5 No 4, 04029 (2013)
DOI
PACS Number(s) 73.20, 73.40.Eq
Keywords Atomic force microscopy (9) , Transmission electron microscope (2) , Silicon carbide (9) , Thin films (60) .
Annotation Diode structure on the basis of amorphous silicon carbide and p-type polycrystalline silicon (Eurosolar) were obtained with magnetron RF-nonreactive sputtering method from solid-phase target in argon atmosphere.

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