Features of Structure of Magnetron Films Si3N4 and SiC

Authors	A.P. Kuzmenko¹ , A.S. Chekadanov² , S.V. Zakhvalinsky², E.A. Pilyuk², M.B. Dobromyslov³
Affiliations	¹ Southwest State University, 94, 50 Let Oktyabrya Str., 305040 Kursk, Russia ² Belgorod State National Research University, 85, Pobedy Str., 308015 Belgorod, Russia ³ Pacific National University, 136, Tihookeanskaya Str., 680035 Khabarovsk, Russia
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Issue	Volume 5, Year 2013, Number 4
Dates	Received 24 October 2013; published online 10 December 2013
Citation	A.P. Kuzmenko, A.S. Chekadanov, S.V. Zakhvalinsky, et al., J. Nano- Electron. Phys. 5 No 4, 04025 (2013)
DOI
PACS Number(s)	61.10.Eq
Keywords	Small-angle X-ray scattering (6) , Atomic force microscopy (9) , Silicon nitride (2) , Silicon carbide (9) , Thin films (60) .
Annotation	By small-angle X-ray scattering and atomic force microscopy shows the features of the structure of thin films of Si3N4 and SiC, deposited by magnetron sputtering on glass substrates.
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