Temperature Influence on the Properties of Thin Si3N4 Films

Authors	V.S. Zakhvalinskii¹ , P.V. Abakumov² , A.P. Kuzmenko² , A.S. Chekadanov² , E.A. Piljuk¹ , V.G. Rodriguez¹, I.J. Goncharov¹, S.V. Taran¹
Affiliations	¹ Belgorod National Research University, 85, Pobedy St., 308015 Belgorod, Russia ² South-West State University, 94, 50 let Oktyabrya St., 305040 Kursk, Russia
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Issue	Volume 7, Year 2015, Number 4
Dates	Received 28 September 2015; published online 10 December 2015
Citation	V.S. Zakhvalinskii, P.V. Abakumov, A.P. Kuzmenko, et al., J. Nano- Electron. Phys. 7 No 4, 04052 (2015)
DOI
PACS Number(s)	75.50.Ee, 75.78.Fg
Keywords	Raman spectroscopy (18) , Small-angle x-ray scattering (6) , Atomic force microscopy (9) .
Annotation	Applying Raman spectroscopy, small-angle x-ray scattering, and atomic force microscopy it were studied phase composition and surface morphology of nanoscale films Si3N4 (obtained by RF magnetron sputtering).
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