Автори | Neha Goel1 , Manoj Kumar Pandey2 |
Афіліація | 1 Research Scholar, SRM University NCR Campus Ghaziabad, India 2 Department of ECE, SRM University NCR Campus Ghaziabad, India |
Е-mail | 17nehagoel@gmail.com, mkspandey@gmail.com |
Випуск | Том 9, Рік 2017, Номер 1 |
Дати | Одержано 24.10.2016, у відредагованій формі - 07.02.2017, опубліковано online - 20.02.2017 |
Цитування | Neha Goel, Manoj Kumar Pandey, J. Nano- Electron. Phys. 9 No 1, 01022 (2017) |
DOI | 10.21272/jnep.9(1).01022 |
PACS Number(s) | 85.30.De |
Ключові слова | Fully depleted silicon on insulator (FDSOI) (2) , Threshold voltage (15) , Sub threshold slope. |
Анотація | In this paper, we discuss how a short channel effects can be suppressed and how a threshold voltage fluctuation can be minimized and better control of subthreshold slope by the impact of the back gate bias and control of gate work function of a fully depleted SOI (Silicon-On-Insulator) MOSFET. The fluctuation in the threshold voltage and subthreshold slope are due to short channel effects. The Back gate voltage plays a significant role on the threshold voltage and thin buried oxide is used to suppress the short-channel effects and is used to keep a low value of the subthreshold slope are described in this paper. It is shown that how short channel effects can be suppressed in order to improve subthreshold slope. |
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