Polygraphene Coatings on Copper: Mechanisms of Nucleation and Growth

Authors I.N. Kolupaev1 , A.V. Murakhovski1, T.S. Koltsova2, V.O. Sobol2, Dai Yu1
Affiliations

1National Technical University «Kharkiv Polytechnic Institute», 2, Kyrpychov Str., 61002 Kharkiv, Ukraine

2Peter the Great St. Petersburg Polytechnic University, 29, Polytechnic Str., 195251 Saint-Petersburg, Russia

Е-mail [email protected]
Issue Volume 10, Year 2018, Number 2
Dates Received 27 December 2017; published online 29 April 2018
Citation I.N. Kolupaev, A.V. Murakhovski, T.S. Koltsova, et al., J. Nano. Electron. Phys. 10 No 2, 02017 (2018)
DOI https://doi.org/10.21272/jnep.10(2).02017
PACS Number(s) 05.45.Df, 61.43.Hv, 81.05.Je, 81.15.Aa
Keywords Polygraphene coating, Optical microscopy, Surface morphology (2) , Computer processing, Fractal dimension.
Annotation

Samples of polygraphene layers on a copper substrate were obtained using CVD technology. For the preparation, a gaseous mixture of methane, hydrogen and argon was used. To analyze the degree of filling and the specific area of the polygraphene formed on a copper substrate, we used optical microscopy (with specialized computer image processing) in combination with Raman spectroscopy and atomic force microscopy. It is proposed to use the approach based on the double structure model (transparent regions of graphene and copper) for evaluating the morphological parameters of the coating of polygraphene on a copper substrate. This approach is used for the primary optimization of the production process of polygraphene formation. The mechanism of initial stages of polygraphene growth on copper is proposed.

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