Electron Beam Technology in Optoelectronic Instrumentation: High-quality Curved Surfaces and Microprofile Creation in Different Geometric Shapes

Authors I.V. Yatsenko1 , V.P. Maslov2, V.S. Antonyuk3 , V.A. Vashchenko1, O.V. Kirichenko4, K.M. Yatsenko1

1Cherkasy State Technological University, 460, Shevchenka Blvd., 18006 Cherkassy, Ukraine

2V.E. Lashkaryov Institute of Semiconductor Physics NAS of Ukraine, 45, Nauky Ave., 02000 Kyiv, Ukraine

3National Technical University of Ukraine “KPI”, 37, Peremohy Ave., 03056 Kyiv, Ukraine

4Cherkasy Institute of Fire Safety named after Chornobyl Heroes of National University of Civil Protection of Ukraine, 8, Onoprienka St., 18034 Cherkasy, Ukraine

Е-mail irina.yatsenko.79@ukr.net
Issue Volume 13, Year 2021, Number 4
Dates Received 29 October 2020; revised manuscript received 15 August 2021; published online 20 August 2021
Citation I.V. Yatsenko, V.P. Maslov, et al., J. Nano- Electron. Phys. 13 No 4, 04034 (2021)
DOI https://doi.org/10.21272/jnep.13(4).04034
PACS Number(s) 42.79.Bh
Keywords Optoelectronic devices, Electronic beam, Optical element, Optimal control.

The curved surface treatment method of optical elements and functional microprofile creation of different geometric shapes using the system of fixed single electronic beams by optimizing the technological parameters of installation (the number of beams, their currents, accelerating voltages and distances to the processed surfaces) is developed. This method allows to create various microoptic parts for optoelectrical devices. The method is based on the practically implemented schemes of location of single electronic beam system that influence curved surfaces of optical elements. According to the developed method, the implementation task was solved using discretely located fixed sources of gaussian type thermal influence with different amplitudes (maximum values of electronic beam heat density) and focus factors influencing the processed surfaces of optical elements. At the same time, the impact control of such sources is carried out automatically using microprocessor equipment. It is shown that while increasing the number of electron rays (up to 50…70), you can get high accuracy of (relative error up to 10 – 4…10 – 5) compliance with the specified complex distributed thermal influences along the processed both flat and curved optical elements necessary for the creation of functional microprofiles on their surfaces of a given geometric shape. At present, due to technical difficulties that are appearing, it is impossible to effectively manage a large number of beams (more than 10...15) However, reducing their number (for example, up to 5...7), it is possible to implement these distributed heat influences with an acceptable accuracy in practice (relative error does not exceed 3...5 %).

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