The Influence of the Ion Implantation of Au– to the Microstructure of the Amorphous-nanocrystaline AlN-TiB2-TiSi2

Authors K.V. Smyrnova1, А.A. Demianenko1, K.A. Dyadyura1, A.S. Radko1, A.V. Pshyk1,2, O.V. Kuzovlev3, H. Amekura4, K. Oyoshi4, Y. Takeda4
Affiliations

1 Sumy State University, 2, Rimsky-Korsakov Str., 40007 Sumy, Ukraine

2 Adam Mickiewicz University in Poznan, NanoBioMedical Centre, PL61614 Poznan, Poland

3 V. N. Karazin Kharkiv National University, 4, Svobody Sq., 61022, Kharkiv, Ukraine

4 National Institute for Material Science (NIMS), 305-0047, Tsukuba, Ibaraki, Japan

Е-mail [email protected]
Issue Volume 7, Year 2015, Number 1
Dates Received 04 February 2015; revised manuscript received 16 March 2015; published online 25 March 2015
Citation K.V. Smyrnova, А.A. Demianenko, K.A. Dyadyura, et al., J. Nano- Electron. Phys. 7 No 1, 01040 (2015)
DOI
PACS Number(s) 52.77.Dq, 61.72.uj, 81.07.Bc
Keywords Ion implantation (5) , Nanocrystallites, Amorphous structures, Vacancy Loops, Interstitial types.
Annotation Direct measurements were performed using TEM, HRTEM, XRD and SEM with microanalysis. The results showed that the thermal annealing at 1300 С in air leads to the formation of nanoscale phases 1015 nm from AlN, AlB2, Al2O3 and TiO2. Moreover, the ion implantation of the negative ions Au– causes fragmentation (decrease) of the size of nanograins to 2-5 nm with the formation of Au– clusters. In addition, the ion implantation leads to the formation of an amorphous oxide film in the depth (at the undersurface layer) of the coating.

List of References