The Influence of the Ion Implantation of Au– to the Microstructure of the Amorphous-nanocrystaline AlN-TiB2-TiSi2

Authors K.V. Smyrnova1, А.A. Demianenko1, K.A. Dyadyura1, A.S. Radko1, A.V. Pshyk1,2, O.V. Kuzovlev3, H. Amekura4, K. Oyoshi4, Y. Takeda4

1 Sumy State University, 2, Rimsky-Korsakov Str., 40007 Sumy, Ukraine

2 Adam Mickiewicz University in Poznan, NanoBioMedical Centre, PL61614 Poznan, Poland

3 V. N. Karazin Kharkiv National University, 4, Svobody Sq., 61022, Kharkiv, Ukraine

4 National Institute for Material Science (NIMS), 305-0047, Tsukuba, Ibaraki, Japan

Issue Volume 7, Year 2015, Number 1
Dates Received 04 February 2015; revised manuscript received 16 March 2015; published online 25 March 2015
Citation K.V. Smyrnova, А.A. Demianenko, K.A. Dyadyura, et al., J. Nano- Electron. Phys. 7 No 1, 01040 (2015)
PACS Number(s) 52.77.Dq, 61.72.uj, 81.07.Bc
Keywords Ion implantation (5) , Nanocrystallites, Amorphous structures, Vacancy Loops, Interstitial types.
Annotation Direct measurements were performed using TEM, HRTEM, XRD and SEM with microanalysis. The results showed that the thermal annealing at 1300 С in air leads to the formation of nanoscale phases 1015 nm from AlN, AlB2, Al2O3 and TiO2. Moreover, the ion implantation of the negative ions Au– causes fragmentation (decrease) of the size of nanograins to 2-5 nm with the formation of Au– clusters. In addition, the ion implantation leads to the formation of an amorphous oxide film in the depth (at the undersurface layer) of the coating.

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