The Effect of Laser Annealing on the Surface Morphology and Optical Characteristics of Nanosilicon Films

Authors T.V. Rodionova , A.S. Sutyagina, A.G. Gumenyuk, L.Y. Robur
Affiliations

Taras Shevchenko National University of Kyiv, 64/13, Volodymyrska Str., 01601 Kyiv, Ukraine

Е-mail [email protected], [email protected], [email protected]
Issue Volume 7, Year 2015, Number 1
Dates Received 10 December 2014; published online 25 March 2015
Citation T.V. Rodionova, A.S. Sutyagina, A.G. Gumenyuk, L.Y. Robur, J. Nano- Electron. Phys. 7 No 1, 01033 (2015)
DOI
PACS Number(s) 68.55. – a, 68.60.Wm
Keywords Nanocrystalline silicon films, Surface roughness (2) , Grain growth, Laser annealing, Optical properties (22) .
Annotation The effect of laser annealing on the surface microrelief and optical properties of nanocrystalline silicon films, prepared by low pressure chemical vapor deposition, has been investigated. It is shown that under the interaction with the laser radiation recrystallization takes place in the films, due to which there is a smoothing of surface irregularities and forming of grain-agglomerates. These structural changes lead to the decrease in the content of the silicon oxide films by reducing the area of the grain boundaries. The additional peak at 480 nm is observed in the absorption spectrum of the films.

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