Development of the RF Ion Sources for Focused Ion Beam Accelerators

Authors V. Voznyi , V. Miroshnichenko, S. Mordyk, D. Shulha, V. Storizhko, V. Tokman
Affiliations Institute of Applied Physics, National Academy of Sciences of the Ukraine, 58, Petropavlovskaya Str., 40000 Sumy, Ukraine
Е-mail [email protected]
Issue Volume 5, Year 2013, Number 4
Dates Received 26 June 2013; published online 31 January 2014
Citation V. Voznyi , V. Miroshnichenko, S. Mordyk, et al., J. Nano- Electron. Phys. 5 No 4, 04060 (2013)
DOI
PACS Number(s) 41.75.Ak, 52.50.Qt, 52.80.Pi
Keywords RF ion source, Plasma (13) , Inductive (2) , Helicon, Multicusp, Sputtering (24) .
Annotation The paper presents the results of investigations of ion sources developed in the IAP of NAS of Ukraine for generation of high brightness ion beams with small energy spread. A series of RF ion sources operated at the frequency of 27.12 MHz were studied: the inductive RF ion source, the helicon ion source, the multi-cusp RF ion source, and the sputter type RF source of metal ions. A global model and transformer model were applied for calculation of RF source plasma parameters. Ion energy spread, ion mass, and ion current density of some sources were measured in the wide range of RF power, extraction voltage and gas pres-sure.

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