Synthesis of Copper Nanoparticles by Cathode Sputtering in Radio-frequency Plasma

Автори Zh.T. Nakysbekov1, M.Zh. Buranbayev1, M.B. Aitzhanov1, G.S. Suyundykova1, M.T. Gabdullin1, 2
Приналежність

1Al-Farabi Kazakh National University, 71, Al-Farabi Ave., 050040 Almaty, Kazakhstan

2Kazakh-British Technical University, 59, Tole bi Str., 050000 Almaty, Kazakhstan

Е-mail nakysbekov.zhasulan@gmail.com
Випуск Том 10, Рік 2018, Номер 3
Дати Одержано 05.04.2018; опубліковано online 25.06.2018
Посилання Zh.T. Nakysbekov, M.Zh. Buranbayev, J. Nano- Electron. Phys. 10 No 3, 03010 (2018)
DOI https://doi.org/10.21272/jnep.10(3).03010
PACS Number(s) 81.10.Bk, 61.46. + w
Ключові слова Copper (8) , Copper nanopowder (2) , Nanoparticles (70) , PVD method, RF plasma, Synthesis (27) , Cathode sputtering.
Анотація

The paper describes the design features of the synthesis of copper nanoparticles by the cathode sputtering method in radio-frequency plasma. The dependence of the size and number of Cu nanoparticles on the plasma power, sputtering time, gas flow and pressure was studied. Optimal parameters for obtaining copper particles with an extended fractal structure were determined.

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