Formation Features of the Porous Silicon Layers Modified by НСl and HBr in the Context of Optical Properties

Authors Е.I. Zubko
Affiliations

Zaporozhye State Engineering Academy, 22, Dobrolubova Str., Zaporozhye 69000, Ukraine

Е-mail [email protected]
Issue Volume 4, Year 2012, Number 2
Dates Received 23 December 2011; revised manuscript received 20 May 2012, published online 04 June 2012
Citation Е.I. Zubko, J. Nano- Electron. Phys. 4 No 2, 02036 (2012)
DOI
PACS Number(s) 78.20. – е
Keywords Porous silicon (3) , Modification (7) , Photoanodizing, Reflection (7) .
Annotation Transmission and reflection spectra, refraction factor of the porous silicon layers produced in HF(48%): HCl:H2O and HF(48%):HBr:H2O solutions are investigated by the sample illumination and without it. It is established that layers produced by electrolytic anodizing in HF(48%):HBr:H2O = 16:2:80 mass% solution have the best antireflective characteristics and smaller optical transmission than other samples.

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