Authors | P.V. Galiy1 , V.I. Vasil′tsiv1, A.P. Luchechko1 , P. Mazur2 , T.M. Nenchuk1 , O.V. Tsvetkova1, І.R. Yarovets′1 |
Affiliations |
1Ivan Franko Lviv National University, 50, Drahomanov Str., 79005 Lviv, Ukraine 2Institute of Experimental Physics, University of Wroclaw, 9, pl. Maxa Borna, 50-204 Wroclaw, Poland |
Е-mail | galiy@electronics.lnu.edu.ua |
Issue | Volume 10, Year 2018, Number 5 |
Dates | Received 08 July 2018; revised manuscript received 22 October 2018; published online 29 October 2018 |
Citation | P.V. Galiy, V.I. Vasil′tsiv, A.P. Luchechko et al., J. Nano- Electron. Phys. 10 No 5, 05039 (2018) |
DOI | https://doi.org/10.21272/jnep.10(5).05039 |
PACS Number(s) | 68.47.Fg; 68.37.Ps; 82.80.Pv |
Keywords | 2β-Ga2O3-SnO2 system, X-ray photoelectron spectroscopy (3) , Elemental-phase study, Topography (2) , Atomic force microscopy (9) . |
Annotation |
The polycrystalline semiconductor materials (PSM) of 2β-Ga2O3-SnO2 system were obtained by the method of high-temperature solid-phase synthesis. Experiments have shown that the efficiency of the synthesis process in the 2β-Ga2O3-SnO2 system essentially depends on the method of the initial compoundsobtaining. The studies of the obtained PSM's surfaces for their possible application in electronic field devices and ones on Schottky barriers, for which the metal/semiconductor, metal/insulator/semiconductor interphase boundaries and their characteristics play a decisive role were conducted. Particularly elemental-phase composition and roughness of PSM's surfaces, which were investigated by an appropriate set of experimental methods – low-energy electron diffraction (LEED), X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). The results obtained for the PSM 2β-Ga2O3-SnO2 system'ssurfaces are compared with the results from the surfaces of β-Ga2O3 single-crystal cleavages and indicate that the PSM surface is quite suitable for the manufacturing of semiconductorelectric field controlleddevices, such as metal/semiconductor, metal/insulator/semiconductor, with a metal control electrode, when one select the relatively smooth areas on the surface of PSM. |
List of References English version of article |