Fabrication and Characterization of Al/p-CuInAlSe2 Thin Film Schottky Diodes

Authors Usha Parihar1, N. Padha1, C.J. Panchal2

1 Department of Physics& Electronics, University of Jammu, Jammu, 180006 J&K, India

2 M.S. University of Baroda, Faculty of Technology and Engineering, 390 009 Vadodara, India

Е-mail pariusha@gmail.com
Issue Volume 5, Year 2013, Number 2
Dates Received 15 February 2013; published online 04 May 2013
Citation Usha Parihar, N. Padha, C.J. Panchal, J. Nano- Electron. Phys. 5 No 2, 02015 (2013)
PACS Number(s) 73.40.QV, 73.61.Ey, 85.30 Hi
Keywords Polycrystalline (2) , schottky diodes (2) , Flash evaporation (3) , Current-voltage (I-V) (2) , Capacitance-voltage (C-V) characteristics, Image force, Dipole lowering effects, Interface states, M-S junction template.
Annotation Al/p-CuInAlSe2 polycrystalline schottky diodes fabricated by flash evaporation method were undertaken for their electrical analysis at room temperature. Diode parameters of the undertaken diodes were then derived from the current-voltage (I-V) as well as capacitance-voltage (C-V) characteristics. It has been observed that the schottky barrier height deduced from the room temperature I-V is lower to that obtained from the C-V characteristics and is attributed to the fact that I-V analysis includes both the image force and dipole lowering effects and is also reduced by the tunneling and leakage currents. The slope variation of the frequency dependent C – 2-V characteristics for the Al/p-CuInAlSe2 Schottky diode at varying frequency values from 50 kHz to 1 MHz suggests a large density of slow traps or interface states at the M-S junction. As emerging from the parameters values energy band diagram of Al and P-CuInAlSe2 has been reconstructed.

List of References