Field Emission Behaviour of the Single Wall Carbon Nanotubes Grown by Plasma Enhanced Chemical Vapour Deposition (PECVD) System

Authors Avshish Kumar1, Shama Parveen1, Samina Husain1, Javid Ali1, Harsh1, M. Husain1,2

1 Department of Physics, Jamia Millia Islamia (A Central University), New Delhi-110025, India

2 Centre for Nanoscience and Nanotechnology, Jamia Millia Islamia, New Delhi-110025, India

Issue Volume 5, Year 2013, Number 2
Dates Received 15 February 2013; revised manuscript received 06 May 2013; published online 07 May 2013
Citation Avshish Kumar, Shama Parveen, Samina Husain, et al., J. Nano- Electron. Phys. 5 No 2, 02012 (2013)
PACS Number(s) 61.48.De, 81.05.Uw
Keywords Carbon nanotubes (14) , PECVD (6) , RF sputtering, Field emission (3) , Scanning electron microscopy (16) , Raman (37) .
Annotation Single wall carbon nanotubes have been grown on Fe using Plasma Enhanced Chemical Vapour Deposition (PECVD) system. The thickness of the Fe film prepared by RF sputtering system was about 10 nm. The field emission characteristic was measured which showed good enhancement factor. The grown CNTs were characterized by various techniques such as SEM, Raman study etc.

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