Автори | Arjimand Ashraf1, Prashant Mani |
Афіліація |
1M. Tech Scholar, ECE Department, SRM University, Delhi NCR, India 2AssociateProfessor, ECE Department, SRM University, Delhi NCR, India |
Е-mail | arjimand66@gmail.com |
Випуск | Том 10, Рік 2018, Номер 4 |
Дати | Одержано 21.03.2018; опубліковано online 25.08.2018 |
Цитування | Arjimand Ashraf, Prashant Mani, J. Nano- Electron. Phys. 10 No 4, 04012 (2018) |
DOI | http://dx.doi.org/10.21272/jnep.10(4).04012 |
PACS Number(s) | 61.48.De |
Ключові слова | SMG SGT SOI MOSFET, Linear region, Sub-threshold, Saturation (6) , DIBL (6) . |
Анотація |
In this paper, we have presented modeling of drain current for single material surrounded gate SOI MOSFET (SMG SGT SOI MOSFET) whose channel length is 40nm. We have studied the behavior of device by varying various device parameters in Linear, Saturation, and Sub-threshold regions. We have also presented a drain current model incorporating DIBL. The comparison between previously presented model with channel length = 50 nm and our scaled model is also presented in various regions of device operation. |
Перелік посилань |