Impact of Annealing Temperature on Surface Reactivity of ZnO Nanostructured Thin Films Deposited on Aluminum Substrate

Authors Zehira Belamri1, Warda Darenfad2 , Noubeil Guermat3
Affiliations

1Laboratory of Phase Transformation, University Frères Mentouri of Constantine 1, 25000 Constantine, Algeria

2Thin Films and Interfaces Laboratory (LCMI), University of Constantine 1, 25000 Constantine, Algeria

3Department of Electronics, Faculty of Technology, University Mohamed Boudiaf of M’sila, 28000 M’sila, Algeria

Е-mail belamri.zehira@umc.edu.dz
Issue Volume 15, Year 2023, Number 2
Dates Received 05 February 2023; revised manuscript received 16 April 2023; published online 27 April 2023
Citation Zehira Belamri, Warda Darenfad, Noubeil Guermat, J. Nano- Electron. Phys. 15 No 2, 02026 (2023)
DOI https://doi.org/10.21272/jnep.15(2).02026
PACS Number(s) 81.15.Pq
Keywords ZnO nanostructures, Electrodeposition (6) , Deformed flowers, Contact angle (2) , Hydrophobic (4) .
Annotation

In the present work, the fabrication of a hydrophobic surface was carried out by thermal oxidation of thin layers of Zn deposited by electrodeposition on an aluminum substrate under air atmosphere at different temperatures between 400 ºC and 500 ºC. Structural analysis by XRD and Raman spectroscopy shows that increasing the annealing temperature leads to the formation of a considerable amount of ZnO on the aluminum substrate. ZnO-bound XRD peaks appear and Zn- and Al-bound peaks decrease. For TS = 400 ºC and 500 ºC, the films treated at are polycrystalline with a hexagonal structure of the Wurtzite type due to the existence of the more intense peak relating to the orientation (100) located around the angle 31.75 º. EDX analysis gives the chemical composition of these films and confirms the presence of zinc and oxygen in an almost stoichiometric composition. The morphological study of thin layers treated at 500 ºC shows the coexistence of nanostructures in the form of deformed flowers, which leads to their hydrophobicity. The contact angle values measured are > 90º for the films treated at 400 ºC and 500 ºC, which confirms the hydrophobic nature with a high value obtained equal to 135º.

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