Optical and Electrochromic Properties of E-Beam Evaporated Nickel Oxide Thin Film

Authors K.J. Patel1 , C.J. Panchal1 , M.S Desai1, P.K. Mehta2
Affiliations

1 Applied Physics Department, Faculty of Technology & Engineering, The M. S. University of Baroda, Vadodara 390001, Gujarat, India

2 Physics Department, Faculty of Science, The M. S. University of Baroda, Vadodara 390002, Gujarat, India

Е-mail [email protected]
Issue Volume 3, Year 2011, Number 1, Part 2
Dates Received 04 February 2011, published online 08 May 2011
Citation K.J. Patel, C.J. Panchal, M.S Desai, P.K. Mehta, J. Nano- Electron. Phys. 3 No1, 362 (2011)
DOI
PACS Number(s) 78.40.Fy, 82.45.Cc, 85.60.Pg, 81.15.Ef, 78.20.Jq, 61.05.cp
Keywords Nickel oxide (2) , Thin film (101) , Optical properties (22) , Electrochromic (4) .
Annotation
Nickel oxide (NiO) thin films were deposited by e-beam evaporation on glass and ITO coated glass substrates initially held at room temperature without post-heat treatments. The structural and optical properties were investigated using glancing incident X-ray diffractometer (GIXRD) and spectrophotometer. The electrochromic (EC) behavior of NiO thin film was investigated using electrochemical technique viz. cyclic voltammetry, constant current measurement, and chronoamperometry in 1 M KOH electrolyte. The transmittance modulation and switching time with different operating voltage were also studied.

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