Field Emission Behaviour of the Single Wall Carbon Nanotubes Grown by Plasma Enhanced Chemical Vapour Deposition (PECVD) System
| Автори | Avshish Kumar1, Shama Parveen1, Samina Husain1, Javid Ali1, Harsh1, M. Husain1,2 |
| Афіліація | 1 Department of Physics, Jamia Millia Islamia (A Central University), New Delhi-110025, India 2 Centre for Nanoscience and Nanotechnology, Jamia Millia Islamia, New Delhi-110025, India |
| Е-mail | |
| Випуск | Том 5, Рік 2013, Номер 2 |
| Дати | Одержано 15.02.2013, у відредагованій формі - 06.05.2013, опубліковано online - 07.05.2013 |
| Цитування | Avshish Kumar, Shama Parveen, Samina Husain, et al., J. Nano- Electron. Phys. 5 No 2, 02012 (2013) |
| DOI | |
| PACS Number(s) | 61.48.De, 81.05.Uw |
| Ключові слова | Carbon nanotubes (14) , PECVD (7) , RF sputtering, Field emission (3) , Scanning electron microscopy (16) , Raman (37) . |
| Анотація | Single wall carbon nanotubes have been grown on Fe using Plasma Enhanced Chemical Vapour Deposition (PECVD) system. The thickness of the Fe film prepared by RF sputtering system was about 10 nm. The field emission characteristic was measured which showed good enhancement factor. The grown CNTs were characterized by various techniques such as SEM, Raman study etc. |
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