Study of ZnO–SnO2 Thin Film Growth Processes

Authors A.Kh. Abduev, A.Sh. Asvarov, A.K. Akhmedov
Affiliations

Institute of Physics, Dagestan Scientific Center of the RAS, 94, Yaragskiy Str., 367003 Makhachkala, Russia

Е-mail cht-if-ran@mail.ru
Issue Volume 10, Year 2018, Number 6
Dates Received 02 August 2018; revised manuscript received – 30 November 2018; published online 18 Desember 2018
Citation A.Kh. Abduev, A.Sh. Asvarov, A.K. Akhmedov, J. Nano- Electron. Phys. 10 No 6, 06020 (2018)
DOI https://doi.org/10.21272/jnep.10(6).06020
PACS Number(s) 81.15.Cd, 68.55.ag
Keywords ZnO (64) , SnO2 (6) , Thin film (101) , Magnetron sputtering (14) , Stoichiometry (2) .
Annotation

The processes of magnetron synthesis of ZnO–SnO2-based films by the magnetron sputtering of metal (Zn–Sn), ceramic (ZnO–SnO2) and composite (ZnO–SnO2 + 10wt.% Zn–Sn) targets were studied. It is shown that during magnetron sputtering of the metal and composite targets a multy-layered structure can be formed due to periodic changes in the composition of the sputtered target surface in the erosion zone.

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