Influence of Deposition Conditions of Thin Polymer Films in Vacuum on Their Dielectric Properties

Authors V.G. Zadorozhniy, A.E. Sergeeva

Odesa National Academy of Food Technologies, 112, Kanatna Str., 65039 Odesa, Ukraine

Issue Volume 10, Year 2018, Number 5
Dates Received 12 August 2018; revised manuscript received 20 October 2018; published online 29 October 2018
Citation V.G. Zadorozhniy, A.E. Sergeeva, J. Nano- Electron. Phys. 10 No 5, 05010 (2018)
PACS Number(s) 73.61.Ph
Keywords Polymer films, Electron-beam sputtering, Dielectric permittivity, Dielectric losses.

Effect of the secondary polymerization conditions on the dielectric properties (e' and tgd) of thin polymer films deposited by decomposition and condensation of polymers in a vacuum was described. The decomposition of the polymer was carried out by an electron beam. Variable parameters during the initiation of the secondary polymerization were the power of the electron beam irradiating the substrate; the condensation (substrate) temperature; the current density of the electrons bombarding the substrate and their energy; and the high frequency discharge voltage during the gas-discharge deposition of the films. The best irradiation parameters were in a certain range, namely: E = 200-400 eV; j = 0.2-0.3 mA/cm2. The studying of the deposited films structure show that minimum amount of free radicals and unsaturated bonds was contained in this interval of the electron energies. Namely, they were the centers of asymmetry worsening dielectric losses in films, especially at high frequencies

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