Growth of Island Films during Vapor-liquid Condensation

Authors S.V. Dukarov , S.I. Petrushenko , V.N. Sukhov

V. N. Karazin Kharkiv National University, 4, Svobody Sq., 61022 Kharkiv, Ukraine

Е-mail [email protected]
Issue Volume 10, Year 2018, Number 1
Dates Received 20 October 2017; revised manuscript received 19 November 2017; published online 24 February 2018
Citation S.V. Dukarov, S.I. Petrushenko, V.N. Sukhov, J. Nano- Electron. Phys. 10 No 1, 01023 (2018)
DOI 10.21272/jnep.10(1).01023
PACS Number(s) 68.55. – a, 68.55.J –
Keywords Growth of island films, Island films, Condensation mechanism, Size distribution (3) , Simulation of film growth.

The results of studying the rules governing the formation and growth of island nanodispersed films condensed in a vacuum by the vapor – liquid mechanism are presented. The evolution of the island size distribution in the process of growth of gallium and tin films on an amorphous carbon substrate was considered. The effect of temperature on the size distribution of microparticles near the maximum supercooling of tin and bismuth island condensates was studied. A computer simulation of the formation of island films taking into account the droplet-liquid coalescence mechanism of islands was carried out. The results of the simulation are consistent with the available experimental data and theoretical concepts of nucleation and growth of island films.

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