The Influence of the Ion Implantation of Au– to the Microstructure of the Amorphous-nanocrystaline AlN-TiB2-TiSi2
| Authors | K.V. Smyrnova1, А.A. Demianenko1, K.A. Dyadyura1, A.S. Radko1, A.V. Pshyk1,2, O.V. Kuzovlev3, H. Amekura4, K. Oyoshi4, Y. Takeda4 |
| Affiliations | 1 Sumy State University, 2, Rimsky-Korsakov Str., 40007 Sumy, Ukraine 2 Adam Mickiewicz University in Poznan, NanoBioMedical Centre, PL61614 Poznan, Poland 3 V. N. Karazin Kharkiv National University, 4, Svobody Sq., 61022, Kharkiv, Ukraine 4 National Institute for Material Science (NIMS), 305-0047, Tsukuba, Ibaraki, Japan |
| Е-mail | smyrnova_katerina@ukr.net |
| Issue | Volume 7, Year 2015, Number 1 |
| Dates | Received 04 February 2015; revised manuscript received 16 March 2015; published online 25 March 2015 |
| Citation | K.V. Smyrnova, А.A. Demianenko, K.A. Dyadyura, et al., J. Nano- Electron. Phys. 7 No 1, 01040 (2015) |
| DOI | |
| PACS Number(s) | 52.77.Dq, 61.72.uj, 81.07.Bc |
| Keywords | Ion implantation (5) , Nanocrystallites, Amorphous structures, Vacancy Loops, Interstitial types. |
| Annotation | Direct measurements were performed using TEM, HRTEM, XRD and SEM with microanalysis. The results showed that the thermal annealing at 1300 С in air leads to the formation of nanoscale phases 1015 nm from AlN, AlB2, Al2O3 and TiO2. Moreover, the ion implantation of the negative ions Au– causes fragmentation (decrease) of the size of nanograins to 2-5 nm with the formation of Au– clusters. In addition, the ion implantation leads to the formation of an amorphous oxide film in the depth (at the undersurface layer) of the coating. |
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