Determining the Critical Parameters of the Electron Beam with Surface Melting of the Optical Elements of Precision Instrumentation

Authors I.V. Yatsenko1 , V.S. Antonyuk2 , V.I. Gordienko3, V.A. Vaschenko1, O.V. Kiritchenko4

1 Cherkasy State Technological University, 460, Shevchenko blvr., 18030 Cherkasy, Ukraine

2 National technical University of Ukraine «KPI», 37, Pobedy ave., 03056 Kiev, Ukraine

3 State Enterprise Scientific Production Complex "Photopribor", 85, Vishnevetzkogo Baida str., 18000, Cherkasy, Ukraine

4 Cherkasy Institute of Fire Safety named Heroes of Chernobyl National University of Civil Protection of Ukraine, 8, Onoprienko str., 18034 Cherkasy, Ukraine

Issue Volume 9, Year 2017, Number 1
Dates Received 18 November 2016; revised manuscript received 07 February 2017; published online 20 February 2017
Citation I.V. Yatsenko, V.S. Antonyuk, V.I. Gordienko, et al., J. Nano- Electron. Phys. 9 No 1, 01010 (2017)
DOI 10.21272/jnep.9(1).01010
PACS Number(s) 42.79.Bh
Keywords The electron beam, Optical element, Thickness of melted layer, Precision engineering.
Annotation Mathematical model of deep melting elements made of optical glasses under the influence of the electron beam. The calculations of the thickness of the melted layer and the velocities of the interface depending on the parameters of electron beam (density and time of thermal influence). It is established that when the thermal change in the density of influence of the beam in the range of 7∙106...8,5∙108 W/m2 and increasing duration of exposure up to 14 s with the thickness of the melted layer can reach 300...500 m. We calculated critical parameters of the electron beam, the exceeding of which leads to disruption of the flatness of the optical elements, changing their geometrical shape and deterioration of technical and operational characteristics of the devices until they exit their building.

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