Автори | S. Ghahramani, H. Kangarlau |
Афіліація | Faculty of science, Urmia branch, Islamic Azad University, Urmia, Iran |
Е-mail | Soghra.Ghahramani@gmail.com, hkangarloo@yahoo.com |
Випуск | Том 5, Рік 2013, Номер 4 |
Дати | Одержано 09.06.2013, у відредагованій формі - 08.07.2013, опубліковано online - 31.01.2014 |
Цитування | S. Ghahramani, H. Kangarlau, J. Nano- Electron. Phys. 5 No 4, 04051 (2013) |
DOI | |
PACS Number(s) | 78.20.Ci, 78.67.Pt |
Ключові слова | Multilayer semiconductors, Magnesium fluoride, Titanium dioxide (4) , Kramers-Kronig. |
Анотація | MgF2 thin films by thickness of 93 nm were deposited on MgF2 / glass and TiO2 / glass thin layers by resistance evaporation method under ultra-high vacuum (UHV) conditions, rotating pre layer for sample one and normal deposition for second one. Optical properties were measured via spectrophotometer in spectral range of 300-1100 nm wave length. The optical constants such as, real part of refractive index (n), imaginary part of refractive index (k), real and imaginary parts of dielectric function ε1, ε2 respectively and absorption coefficient (), were obtained from Kramers-Kronig analysis of reflectivity curves. Band-gap energy was also estimated for these films. |
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