Автори | Palash Das, Dhrubes Biswas |
Афіліація | Indian Institute of Technology Kharagpur, Kharagpur, India |
Е-mail | d.palash@gmail.com |
Випуск | Том 7, Рік 2015, Номер 1 |
Дати | Одержано 12.12.2014, опубліковано online - 25.03.2015 |
Цитування | Palash Das, Dhrubes Biswas, J. Nano- Electron. Phys. 7 No 1, 01006 (2015) |
DOI | |
PACS Number(s) | 73.21.Fg, 81.05.Ea, 85.30.Tv |
Ключові слова | AlGaN / GaN (2) , Modeling (20) , Threshold voltage (15) , Linearity. |
Анотація | In this paper, the gate threshold voltage of AlGaN / GaN HEMT devices has been analytically predicted based on the calculated energy levels inside triangular quantum well at the hetero-interface and found to be comparable with experimental data. The conceptual explanation of device linearity in large signal applications has been presented in terms of quantized energy levels in the quantum well. The dependence of threshold voltage and linear operable gate voltage range on a newly introduced parameter named “Surface Factor” is analyzed as well. |
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