Magnetic Properties of Fe/Cu Multilayers Prepared Using Pulsed-Current Electrodeposition

Authors C. Rizal1, Y. Ueda2, B.R. Karki3
Affiliations

1 University of British Columbia 2010-2332 Main Mall, V6T 1Z4, Vancouver, Canada

2 Muroran Institute of Technology 27-1 Mizomoto-Cho, 050-8585, Muroran, Japan

3 Texas Tech University 2500 Broadway, Texas Tech University, 79409, Lubbock, USA

Е-mail crizal@ece.ubc.ca
Issue Volume 4, Year 2012, Number 1
Dates Received 18 June 2011; revised manuscript received 19 February 2012; published online 14 March 2012
Citation C. Rizal, Y. Ueda, B.R. Karki, J. Nano-Electron. Phys. 4 No 1, 01001 (2012)
DOI
PACS Number(s) 5.47.+a, 68.65.Ac
Keywords Pulsed-current deposition, Fe/Cu, Multilayers (4) , Saturation magnetization (5) , Microstructure (20) .
Annotation [Fe (tFe) nm/Cu (tCu) nm]N multilayer films were prepared using pulsed-current electrodeposition method. The role of the pulsed-current deposition and Fe and Cu layer thicknesses on the magnetic properties was investigated. The microstructure of the multilayer films is dependent on the thicknesses of both the Fe and Cu layers. The saturation magnetization of the multilayers strongly correlated with the crystalline structure of Fe at the interface of Fe and Cu layers.

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