Formation of the Electric Field Distribution in Thin Electro-Optic Layers for Precision Correction their Optical Characteristics

Authors R.N. Zhukov , S.V. Ksenich, I.V. Kubasov , A.A. Temirov , N.G. Timushkin , D.A. Kiselev , A.S. Bykov , M.D. Malinkovich , Yu.N. Parkhomenko

National University of Science and Technology "MISiS", 4, Leninskiy pr., 119049 Moscow, Russian Federation

Issue Volume 8, Year 2016, Number 3
Dates Received 20 April 2016; published online 03 October 2016
Citation R.N. Zhukov, S.V. Ksenich, I.V. Kubasov, et al., J. Nano- Electron. Phys. 8 No 3, 03011 (2016)
DOI 10.21272/jnep.8(3).03011
PACS Number(s) 77.80.Dj, 68.55. – a, 77.55.H –
Keywords Lithium niobate (3) , Electro-optical structures, Piezoresponse force microscopy (4) , Computer simulations.
Annotation A method of making given field distribution within thin electro-optical layers by using narrow band electrodes placed at the same electric potential. A formula for electric field intensity produced by a single band electrode is obtained. Electric field modeling for different band electrode configurations is undertaken. It was shown, by applying piezoresponse force microscopy, that in case of highly inhomogeneous field the polarization of lithium niobate electro-optical film persisted only in the area above the band electrode.

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