Modeling of Threshold Voltage and Drain Current of Uniaxial Strained p-MOSFETs

Автори Amit Chaudhry1, Sonu Sangwan2, Jatindra Nath Roy3
Приналежність

1 UIET, Panjab University, Sector – 25, 91160014, Chandigarh, India

2 UIET, Panjab University, Sector – 25, 91160014, Chandigarh, India

3 Solar Semiconductor Private Limited, Hyderabad, India

Е-mail amit_chaudhry01@yahoo.com
Випуск Том 3, Рік 2011, Номер 4
Дати Received 11 August 2011, published online 30 December 2011
Посилання Amit Chaudhry, Sonu Sangwan, Jatindra Nath Roy, J. Nano- Electron. Phys. 3 No4, 27 (2011)
DOI
PACS Number(s) 85.30.De, 85.30.Tv
Ключові слова Mobility (10) , Strained–Si, Model (52) , Numerical (7) .
Анотація
An analytical model describing the threshold voltage and drain current in strained-Si p-MOSFETs as a function of applied uniaxial strain applied at the gate has been developed in this paper. The uniaxial stress has been applied through the silicon nitride cap layer. The results show that the threshold voltage falls and drain current rises due to applied uniaxial strain. The results have also been compared with the experimentally reported results and show good agreement.

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