The optimization of optical thin films deposition using in-situ reflectivity measurements and simulation

Автори G.G. Bhatt1, Vipul Kheraj2, M.S. Desai1 , C.J. Panchal1
Приналежність

1 Applied Physics Department, Faculty of Tech. & Engg., The M. S. University of Baroda, Vadodara (Gujarat), India

2 Department of Applied Physics, Sardar Vallabhbhai National Institute of Technology, Surat, India

Е-mail cjpanchal_msu@yahoo.com
Випуск Том 3, Рік 2011, Номер 1, Part 4
Дати Received 04 February 2011, in final form 13 October 2011, published online 17 October 2011
Посилання G.G. Bhatt, Vipul Kheraj, M.S. Desai, C.J. Panchal, J. Nano- Electron. Phys. 3 No1, 721 (2011)
DOI
PACS Number(s) 68.65.Ac, 78.20.Ci
Ключові слова Thin film (101) , Multilayers (4) , In-situ, Reflectivity (3) , Simulation (32) .
Анотація
We have optimized and automated the experimental in-situ reflectivity measurement system for the laser diode (LD) facet coating. We have also developed a reflectivity-simulator program that gives the reflectivity data as a function of the thickness of the film (single or multi-layer) for a given wavelength, which aids in optimizing the above parameters while monitoring the coating of the films in-situ. We report the results for the in-situ reflectivity of a single layer MgF2 and a quarter-wave optical thick three bi-layer pairs of MgF2 and silicon on GaAs as a substrate for both the cases. We have achieved up to 83 % experimental reflectivity for the latter case.

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