Автори | Manjula Vijh1,2 , R.S. Gupta3 , Sujata Pandey4 |
Афіліація | 1 Amity University Uttar Pradesh, Noida, India 2 Amity School of Engineering and Technology, New Delhi, India 3 Maharaja Agrasen Institute of Technology, New Delhi, India 4 Amity Institute of Telecom Engineering and Management, Amity University Uttar Pradesh, Noida, India |
Е-mail | mvijh@amity.edu, spandey@amity.edu |
Випуск | Том 9, Рік 2017, Номер 4 |
Дати | Одержано 18.04.2017, у відредагованій формі - 25.07.2017, опубліковано online - 27.07.2017 |
Цитування | Manjula Vijh, R.S. Gupta, Sujata Pandey, J. Nano- Electron. Phys. 9 No 4, 04004 (2017) |
DOI | 10.21272/jnep.9(4).04004 |
PACS Number(s) | 67.72.uj, 61.82.Fk, 71.55.Eq,85.30.De |
Ключові слова | Gate All Around Tunnel FET, Heterojunction (6) , Small signal parameters, Broken-gap (2) . |
Анотація | This work presents simulation study and analysis of nanoscale III-V Heterojunction Gate All Around Tunnel Field Effect Transistor, along with the extraction of small signal parameters of the device. Transfer characteristics and output characteristics of the device were observed. The device is simulated for extraction of small signal parameters such as transconductance, gate-source capacitance, gate-drain capacitance, by varying doping concentration of drain region and channel length. Cut-off frequency of the device is also obtained. The results reported agree well with the data available in literature. |
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