Platinum Nanoparticle Deposition on the Silicon Surface by Galvanic Replacement in DMSO Medium

Authors M.V. Shepida1, O.I. Kuntyi1, S.A. Korniy2

1Lviv Polytechnic National University, 12, S. Bandera St., 79013 Lviv, Ukraine

2Karpenko Physico-Mechanical Institute of NASU, 5, Naukova St., 79060 Lviv, Ukraine

Issue Volume 14, Year 2022, Number 1
Dates Received 11 January 2022; revised manuscript received 21 February 2022; published online 28 February 2022
Citation M.V. Shepida, O.I. Kuntyi, S.A. Korniy, J. Nano- Electron. Phys. 14 No 1, 01021 (2022)
PACS Number(s) 61.46. + w, 81.15. − z
Keywords Platinum, Galvanic replacement, Silicon surface, DMSO, Nanoparticles (70) .

The results of studies of the formation of platinum nanoparticles (Pt NPs) on the silicon surface by galvanic replacement (GR) in a fluoride-containing solution of H2[PtCl6] in dimethyl sulfoxide (DMSO) are presented. The conditions of the deposition process of Pt NPs on the substrate surface are established. It is shown that in a wide range of platinum precursor concentrations (1-4 mmol·l – 1) and temperature (30-50 °С), discrete spherical metal nanoparticles (Pt NPs) with a diameter of 20 to 200 nm with uniform distribution on the substrate surface are formed. The main factors influencing the geometry of nanoparticles are the concentration of H2[PtCl6], temperature and duration of GR. As the values of these factors increase, the particle size increases. Ultrasound accelerates the GR process, which increases the size of Pt NPs and promotes the formation of a metal film on the silicon surface. It is shown that concentrations of platinum ions and DMSO medium during GR are one of the main factors influencing the size of discrete particles with a small size range and uniform distribution on the substrate surface. It was found that with increasing temperature from 30 to 50 °C there is a change in the structure of platinum sediment from discrete to the formation of agglomerates, which is due to a significant increase in the rate of electrogeneration reaction at the anode surfaces. It was found that increasing the duration of the GR process from 30 to 60 s contributes to the filling density of the silicon surface. The results of studies of the influence of organic aprotic solvent molecules on the geometry of metal particles and their distribution on the substrate surface are obtained. Nanostructures of platinum with good adhesion to the substrate surface were obtained.

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