Formation of Nanostructured Thin Film Coatings for Nanocatalysts
| Автори | S.V. Tomilin, A.S. Yanovsky |
| Афіліація | Zaporizhzhya National University, 66, Zhukovsky Str., 69600 Zaporizhzhya, Ukraine |
| Е-mail | tomilin_znu@mail.ru |
| Випуск | Том 4, Рік 2012, Номер 1 |
| Дати | Received 27 October 2012; published online 14 March 2012 |
| Цитування | S.V. Tomilin, A.S. Yanovsky, J. Nano-Electron. Phys. 4 No 1, 01013 (2012) |
| DOI | |
| PACS Number(s) | .55. –a |
| Ключові слова | Nanostructuring (3) , Palladium, Vacuum deposition (2) , Thermal annealing (4) , Mechanical stress (2) , Yield stress. |
| Анотація | The paper presents the results of theoretical basis of possibility of nanostructured thin-film formation by mechanical stress creation in ultra-thin films deposited on a substrate during their thermal annealing. The experiment results of palladium (Pd) ultra-thin films obtained on silicon (Si) substrates and their vacuum annealing are also presented. The samples were studied by AES and SEM methods. |
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