Substrate Temperature Effect on Structural Properties of Bi2Te3 Thin Films
| Автори | B.S. Jariwala, D.V. Shah, Vipul Kheraj |
| Приналежність | Department of Applied Physics, S.V. National Institute of Technology, Ichchha Nath, Piplod, 395 007, Surat, India |
| Е-mail | j.bhakti@ashd.svnit.ac.in |
| Випуск | Том 3, Рік 2011, Номер 1, Part 1 |
| Дати | Received 04 February 2011, in final form 20 March 2011, published online 23 March 2011 |
| Посилання | B.S. Jariwala, D.V. Shah, Vipul Kheraj, J. Nano- Electron. Phys. 3 No1, 101 (2011) |
| DOI | |
| PACS Number(s) | 61.05.Cp, 61.72.Dd, 61.72.Ff,07.85.Jy, 61.72.Hh, 61.72.Nn |
| Ключові слова | Bismuth telluride thin films, X-ray diffraction (19) , Structural parameters (5) , Dislocation density (4) , Micro strain, Stacking fault. |
| Анотація |
Structural properties of Bi2Te3 thin films, thermally evaporated on well-cleaned glass substrate at different substrate temperature, are reported here. X-ray diffraction was carried out for the structural characterization. XRD pattern of the films exhibits preferential orientation along the [0 1 5] direction for the films of all the substrate temperature together with other supported planes [2 0 5] & [1 1 0]. All deposition conditions like thickness, deposition rate and pressure were maintained throughout the experiment. X-ray diffraction lines confirm that, the grown films are polycrystalline in nature with the hexagonal crystal structure. The effect of substrate temperature on these parameters have been investigated and reported in this paper. Various structural parameters such as lattice constants, grain size, micro strain, number of crystallites, stacking fault and dislocation density were calculated using X-ray diffraction analysis. |
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