Prerequisites and Prospects of Inductive-Magnetron Plasma Excitation in Cold-Cathode Sources

This article reviews the physical principles, current state, and development prospects of inductively-magnetron plasma excitation (IMP) in cold cathode-based sources. This hybrid plasma generation approach combines the high ion density of coupled plasmas with the spatial control of magnetron systems, offering potential for advanced applications in micro- and nanotechnologies. The review systematically addresses major research directions, including plasma modeling, magnetron sputtering, ion-plasma technologies, high-frequency ion sources, and plasma etching and deposition techniques. Special attention is given to the historical development of cold cathodes, recent advances in inductive plasma excitation, and HiPIMS technologies. The article highlights significant research gaps, particularly in understanding the interaction between inductive and magnetron excitation in hybrid systems, and the lack of comprehensive theoretical models describing plasma behavior under combined excitation. Rather than offering technical solutions, the work aims to establish a conceptual framework for further development of compact, efficient plasma sources. The review targets researchers in plasma physics, surface engineering, and materials science.