Influence of the Surface Diffusion Length on the Roughness of Thin Layers Obtained by Random Deposition
| Authors | A. Saoudi1,2 , L. Aissani3,4, S. Boulahrouz1,5, L. Radjehi4,6, O. Chahaoui1,2, M. Mebarki7, H. Djebaili1,2 |
| Affiliations |
1Mechanical Engineering Department, Abbes Laghrour-Khenchela University, PO Box 1252, Khenchela 40004, Algeria 2Engineering and Advanced Materials Science Laboratory (ISMA), Abbes Laghrour- Khenchela University, PO Box 1252, Khenchela 40004, Algeria 3Laboratory of Active Components and Materials, Larbi Ben M’Hidi University, Oum El Bouaghi, Algeria 4Matter Science Department, Abbes Laghrour-Khenchela University, PO Box 1252, Khenchela 40004, Algeria5` Electromechanical Engineering Laboratory, Annaba 23000, Algeria 5Electromechanical Engineering Laboratory, Annaba 23000, Algeria 6LASPIA Laboratoire des Structures, Propriétés et Interactions Inter Atomiques, Khenchela University, Khenchela 40000, Algeria 7Centre de Recherche en Technologie des Semi-conducteurs pour l’Energétique (CRTSE), 2, Bd Frantz Fanon, BP 140 Alger 7-Merveilles, 16038, Algeria |
| Е-mail | saoudi_abdenour@univ-khenchela.dz |
| Issue | Volume 14, Year 2022, Number 5 |
| Dates | Received 02 September 2022; revised manuscript received 20 October 2022; published online 28 October 2022 |
| Citation | A. Saoudi, L. Aissani, et al., J. Nano- Electron. Phys. 14 No 5, 05021 (2022) |
| DOI | https://doi.org/10.21272/jnep.14(5).05021 |
| PACS Number(s) | 62.20.Qp, 68.60.Dv |
| Keywords | Growth surface, Roughness (3) , Diffusion length, Correlation (5) , Scaling exponents. |
| Annotation |
This work identifies a theorical model using the MATLAB software that represents the effect of the surface diffusion length D on the topography and growth dynamics of thin layers obtained by random deposition. The obtained results show that the interface roughness becomes smoother at higher diffusion lengths D. For D > 0, the growth exponent varies according to two distinct regimes, β1 = 0.5 presents a completely random growth regime and a constant β2 presents a diffusion regime of particles towards the hollows, which decreases with increasing D. The interface roughness will never saturate at zero diffusion length, while the roughness exponent takes a lower value of about α = 0,1450 at D = 4. Finally, the scaling exponents β, α and z directly depend on the diffusion length D and are not related to the substrate size L. The obtained results agree well with other previous theoretical and experimental works. |
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List of References |
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