| Title |
Properties of Silicon Dioxide Films Prepared Using Silane and Oxygen Feeds by PE-CVD at low Power Plasma |
| Authors |
S.P. Gore, A.M. Funde, T.S. Salve, T.M. Bhave, S.R. Jadkar, S.V. Ghaisas |
| Issue |
Volume 3, Year 2011, Number 1, Part 2 |
| Pages |
0370 - 0375 |
| Title |
Nanostructured Hydrogenated Silicon Films by Hot-Wire Chemical Vapor Deposition: the Influence of Substrate Temperature on Material Properties |
| Authors |
V.S. Waman, M.M. Kamble, M.R. Pramod, A.M. Funde, V.G. Sathe, S.W. Gosavi, S.R. Jadkar |
| Issue |
Volume 3, Year 2011, Number 1, Part 3 |
| Pages |
0590 - 0600 |
| Title |
Inter-Electrode Separation Induced Amorphous-to-Nanocrystalline Transition of Hydrogenated Silicon Prepared by Capacitively Coupled RF PE-CVD Technique |
| Authors |
A.M. Funde, V.S. Waman, M.M. Kamble, M.R. Pramod, V.G. Sathe, S.W. Gosavi, S.R. Jadkar |
| Issue |
Volume 3, Year 2011, Number 1, Part 4 |
| Pages |
0651 - 0661 |
