Field Emission Behaviour of the Single Wall Carbon Nanotubes Grown by Plasma Enhanced Chemical Vapour Deposition (PECVD) System

Автор(ы) Avshish Kumar1, Shama Parveen1, Samina Husain1, Javid Ali1, Harsh1, M. Husain1,2
Принадлежность

1 Department of Physics, Jamia Millia Islamia (A Central University), New Delhi-110025, India

2 Centre for Nanoscience and Nanotechnology, Jamia Millia Islamia, New Delhi-110025, India

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Выпуск Том 5, Год 2013, Номер 2
Даты Получено 15.02.2013; в отредактированной форме - 06.05.2013; опубликовано online 07.05.2013
Ссылка Avshish Kumar, Shama Parveen, Samina Husain, et al., J. Nano- Electron. Phys. 5 No 2, 02012 (2013)
DOI
PACS Number(s) 61.48.De, 81.05.Uw
Ключевые слова Carbon nanotubes (14) , PECVD (6) , RF sputtering, Field emission (3) , Scanning electron microscopy (16) , Raman (37) .
Аннотация Single wall carbon nanotubes have been grown on Fe using Plasma Enhanced Chemical Vapour Deposition (PECVD) system. The thickness of the Fe film prepared by RF sputtering system was about 10 nm. The field emission characteristic was measured which showed good enhancement factor. The grown CNTs were characterized by various techniques such as SEM, Raman study etc.

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