Effect of Annealing on Magnetic and Structural Properties of FeNi Thin Films

Автор(ы) A. Sharma1, J. Tripathi2, Yogesh Kumar1, G.S. Chandrawat1,2 , R. Bisen1,2, S. Tripathi3
Принадлежность

1Department of Physics, Manipal University Jaipur, Jaipur, India

2Department of Physics, ISLE, IPS Academy, Indore, India

3Atomic and Molecular Physics Division, Bhabha Atomic Research Centre, Mumbai, India

Е-mail anupamcsr@gmail.com
Выпуск Том 12, Год 2020, Номер 2
Даты Received 15 February 2020; revised manuscript received 10 April 2020; published online 25 April 2020
Ссылка A. Sharma, J. Tripathi, et al., J. Nano- Electron. Phys. 12 No 2, 02040 (2020)
DOI https://doi.org/10.21272/jnep.12(2).02040
PACS Number(s) 75.70.i, 68.37.Ps, 68.37.Rt
Ключевые слова XRD (63) , MOKE, FeNi (2) , Structural (40) , Magnetic (77) .
Аннотация

In this work, we have deposited FeNi (60 nm) film on Si (111) substrate using electron beam evaporation technique. XRD measurements carried out on thin film with annealing the sample from 100 to 400 C show increase in intensity of the FeNi (111) diffraction peak. The particle size increases from 19 nm (as deposited sample) to 27 nm (400 C) with annealing. The magnetization measurements carried out using MOKE technique show enhancement in coercivity with annealing. The overall results are attributed in terms of annealing induced structural change which modify the magnetic properties.

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