Effect of Glow-discharge Hydrogen Plasma Treatment on Zinc Oxide Layers Prepared through Pulsed Electrochemical Deposition and via SILAR Method

Автор(ы) N.P.  Klochko1, K.S. Klepikova1, S.I. Petrushenko2, A.V. Nikitin3, V.R. Kopach1, I.V. Khrypunova1, D.O. Zhadan1, S.V. Dukarov2, V.M. Lyubov1, A.L. Khrypunova1
Принадлежность

National Technical University “Kharkiv Polytechnic Institute”, 2, Kyrpychov St., 61002 Kharkiv, Ukraine

V.N. Karazin Kharkiv National University, 4, Svobody Square, 61022 Kharkiv, Ukraine

National Science Center “Kharkov Institute of Physics & Technology”, 1, Academichna St., 61108 Kharkiv, Ukraine 

Е-mail catherinakle@gmail.com
Выпуск Том 11, Год 2019, Номер 5
Даты Received 07 May 2019; revised manuscript received 21 October 2019; published online 25 October 2019
Ссылка N.P. Klochko, K.S. Klepikova, et al., J. Nano- Electron. Phys. 11 No 5, 05002 (2019)
DOI https://doi.org/10.21272/jnep.11(5).05002
PACS Number(s) 81.40.Wx
Ключевые слова Glow discharge, Zinc oxide (10) , Pulse electrodeposition, SILAR (4) , Hydrogen plasma treatment.
Аннотация

In this work, we investigated the effect of glow-discharge H2+ plasma treatment on ZnO layers deposited on fluorine doped tin oxide (FTO) glass substrates through low temperature aqueous solution growth, namely, via a pulsed electrochemical deposition and by successive ionic layer adsorption and reaction (SILAR) technique. It is shown that the crystal structure, surface morphology, chemical composition and optical properties obtain some destructive changes after plasma processing due to the creation of oxygen vacancies Vo and H-related defects, and additionally, because of the zinc oxide etching by the glow-discharge H2+ plasma through reduction of zinc oxide and evaporation of Zn from the surface. Nevertheless, our investigations show quite good stability of the ZnO layers to the plasma-induced radiation and chemical impacts under high total H2+ fluence received by every ZnO/FTO sample ~ 8·1018 cm – 2.

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