Formation of Nanostructured Thin Film Coatings for Nanocatalysts

Автор(ы) S.V. Tomilin, A.S. Yanovsky
Принадлежность Zaporizhzhya National University, 66, Zhukovsky Str., 69600 Zaporizhzhya, Ukraine
Е-mail tomilin_znu@mail.ru
Выпуск Том 4, Год 2012, Номер 1
Даты Received 27 October 2012; published online 14 March 2012
Ссылка S.V. Tomilin, A.S. Yanovsky, J. Nano-Electron. Phys. 4 No 1, 01013 (2012)
DOI
PACS Number(s) .55. –a
Ключевые слова Nanostructuring (3) , Palladium, Vacuum deposition (2) , Thermal annealing (4) , Mechanical stress (2) , Yield stress.
Аннотация The paper presents the results of theoretical basis of possibility of nanostructured thin-film formation by mechanical stress creation in ultra-thin films deposited on a substrate during their thermal annealing. The experiment results of palladium (Pd) ultra-thin films obtained on silicon (Si) substrates and their vacuum annealing are also presented. The samples were studied by AES and SEM methods.

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