The Asymmetry of the Distribution Density Volume Uncompensated Charge at the Metallurgical p-n Junction

Author(s) A.S. Mazinov1,2, А.I. Shevchenko1, M.A. Bykov1

1 National Taurida V.I. Vernadsky University, 4 Vernadsky av., Simferopol 95007, Crimea, Ukrane

2 Crimean Scientific Center of NAS and MES, 2 Vernadsky av., Simferopol 95007, Crimea, Ukrane

Issue Volume 4, Year 2012, Number 3
Dates Received 31 August 2012; published online 07 November 2012
Citation English version unavailable
PACS Number(s) 71.22._i, 71.23.An
Key words Shallow p-n junction, Doping profile of the crystal, Diffusion activation energy for diffusion, Density of the charge distribution, Uncompensated charge p-n junction.
Annotation The features of the formation of shallow junction and its calculation for a solar cell based on single-crystal silicon with front boron were considered. The ambiguity of the calculated profiles recompensating impurity, which is dependent on the accuracy of the constants of diffusion equations, was shown.


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