Simulation of the Process of a Micro-components Fabrication for Vacuum Electronics and X-ray Optics Using Proton Beam Writing

Author(s) A.G. Ponomarev1,2, A.S. Lapin1, S.V. Kolinko1 , V.A. Rebrov1, V.O. Zhurba2, M.V. Petrovskyi2, V.N. Kolomiec1, C.N. Kravchenko1

1 Institute of Applied Physics National Academy of Sciences of Ukraine, 58, Petropavlivska Str., 40000 Sumy, Ukraine

2 Sumy State University, 2, Rimsky Korsakov Str., 40007 Sumy, Ukraine

Issue Volume 9, Year 2017, Number 6
Dates Received 27 September 2017; revised manuscript received 29 October 2017; published online 15 November 2017
Citation A.G. Ponomarev, A.S. Lapin, S.V. Kolinko, et al., J. Nano- Electron. Phys. 9 No 6, 06010 (2017)
DOI 10.21272/jnep.9(6).06010
PACS Number(s) 42.82.Cr; 85.40.Hp; 81.16.Nd
Key words Micro-components, Proton beam writing, Scanning system, Diffraction grating.
Annotation A numerical simulation of the scanning process by a focused beam of 1 MeV protons in a protoт beam writing channel based on an electrostatic accelerator is carried out to select the dimensions of the deflecting plates of the electrostatic scanning system. The selection condition was the maximum value of scanning raster on the surface of the irradiated sample and minimization of the beam deflection along the optical axis. A program has been developed for constructing a scan profile by a beam that adequately reflects the pattern of the fabricated microcomponents. The process of preparation of samples with drawing of a thin layer of resistive material is fulfilled. Doses of irradiation of samples with a proton beam are determined to obtain conditions for complete etching of the irradiated region. Test experiments were carried out to check the operability of the scanning process by using control system.


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