The Optimization of Optical Thin Films Deposition Using In-Situ Reflectivity Measurements and Simulation

Author(s) G.G. Bhatt1, Vipul Kheraj2, M.S. Desai1 , C.J. Panchal1
Affiliations

1 Applied Physics Department, Faculty of Tech. & Engg., The M. S. University of Baroda, Vadodara (Gujarat), India

2 Department of Applied Physics, Sardar Vallabhbhai National Institute of Technology, Surat, India

Е-mail cjpanchal_msu@yahoo.com
Issue Volume 3, Year 2011, Number 1, Part 4
Dates Received 04 February 2011, in final form 13 October 2011, published online 17 October 2011
Citation G.G. Bhatt, Vipul Kheraj, M.S. Desai, C.J. Panchal, J. Nano- Electron. Phys. 3 No1, 721 (2011)
DOI
PACS Number(s) 68.65.Ac, 78.20.Ci
Key words Thin film (82) , Multilayers (4) , In-situ, Reflectivity, Simulation (27) .
Annotation
We have optimized and automated the experimental in-situ reflectivity measurement system for the laser diode (LD) facet coating. We have also developed a reflectivity-simulator program that gives the reflectivity data as a function of the thickness of the film (single or multi-layer) for a given wavelength, which aids in optimizing the above parameters while monitoring the coating of the films in-situ. We report the results for the in-situ reflectivity of a single layer MgF2 and a quarter-wave optical thick three bi-layer pairs of MgF2 and silicon on GaAs as a substrate for both the cases. We have achieved up to 83 % experimental reflectivity for the latter case.

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