Schottky Contact of Gallium on p-Type Silicon

Author(s) B.P. Modi1, K.D. Patel2
Affiliations

1 Department of Physics, Veer Narmad South Gujarat University, Surat-395 007, India

2 Departments of Physics, Sardar Patel University, Vallabh Vidyanagar-388 120, India

Е-mail bharatpmodi.bharuch@gmail.com
Issue Volume 3, Year 2011, Number 1, Part 4
Dates Received 04 February 2011, published online 17 October 2011
Citation B.P. Modi, K.D. Patel, J. Nano- Electron. Phys. 3 No1, 684 (2011)
DOI
PACS Number(s) 73.30 + y, 73.20 – r
Key words Schottky contact (5) , Thin film (82) , Interfacial strain, Barrier height (10) , Flat band barrier height, Ideality factor (9) .
Annotation
The evolution of barrier at Schottky contact and its stabilization to value characterized by the barrier height and unambiguous measurement is still being curiously perused as they hold the key control and manufacture of tailor made Schottky devices for a host of existing and potential for future applications in electronics, optoelectronics and microwave devices. In this context, gallium – silicon Schottky diode has been fabricated and analyzed.

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